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半导体先进制程 · A 股SEMICONDUCTOR · A-shares

SEMICONDUCTOR半导体先进制程

2nm / 先进封装。A 股卡位:设备、EUV 光源、光学、特气、EDA。2nm / advanced packaging. A-share chokepoints: Equipment, EUV source, Optics, Specialty gases, EDA.

20 节点nodes·58 A 股A-shares·58 已加载报价quotes loaded
成品 / 应用End Product / App· 19 子节点sub-nodes
半导体先进制程SEMICONDUCTOR
SEMICONDUCTOR半导体先进制程

全世界都盯着 2nm 旗舰芯片本身 — 但真正的护城河藏在上游:光刻机、EUV 光源、光学、特种气体、EDA 软件,谁也绕不开The world focuses on the 2nm flagship chip itself — but the real moat lies upstream: lithography machines, EUV light sources, optics, specialty gases, and EDA software. Nobody can bypass any of them.

部件Component· 1 子节点sub-nodes
EDA 软件 / IP(盲区) ●EDA Software / IP (Hidden Chokepoint) ●
EDA Software / IP (Hidden Chokepoint) ●EDA 软件 / IP(盲区) ●

2nm 数十亿晶体管全靠 EDA 工具自动布局布线 — 三家卡死全行业,任何芯片都得先过这一关Billions of transistors at 2nm depend entirely on EDA tools for automated place-and-route — three firms lock up the entire industry, and every chip must pass through them.

材料Material
物理验证 / 签核 (Signoff)Physical Verification / Signoff
Physical Verification / Signoff物理验证 / 签核 (Signoff)

良率前的最后一道软件关卡The final software gate before yield.

子系统Subsystem· 8 子节点sub-nodes
晶圆制造 · 前道 (Front-End)Wafer Fabrication · Front-End-of-Line (FEOL)
Wafer Fabrication · Front-End-of-Line (FEOL)晶圆制造 · 前道 (Front-End)

把版图刻进硅片 — 这是整条链最烧钱、最被低估上游设备的环节Pattern the layout onto silicon wafers — the most capital-intensive segment of the chain and the most underappreciated for upstream equipment.

材料Material· 2 子节点sub-nodes
EUV 光刻 / 光源 · 光学(盲区) ●EUV Lithography / Light Source · Optics (Hidden Chokepoint) ●
EUV Lithography / Light Source · Optics (Hidden Chokepoint) ●EUV 光刻 / 光源 · 光学(盲区) ●

全世界只有 ASML 一家能造 EUV 光刻机 — 这是 2nm 唯一不可替代的咽喉,垄断中的垄断Only ASML in the entire world can manufacture EUV lithography machines — this is the sole irreplaceable chokepoint for 2nm, a monopoly within a monopoly.

能源 / 基础设施Energy / Infrastructure
EUV 反射镜 / 光罩 (Mask/Blank)EUV Reflective Optics / Photomask (Mask / Blank)
EUV Reflective Optics / Photomask (Mask / Blank)EUV 反射镜 / 光罩 (Mask/Blank)

13.5nm EUV 不能折射只能反射,镜片和掩膜母版精度逼近原子级At 13.5nm, EUV cannot refract and must reflect; mirrors and mask blanks require near-atomic-level precision.

能源 / 基础设施Energy / Infrastructure
EUV 光阻 / 锡液滴靶 (Tin Droplet)EUV Photoresist / Tin Droplet Target
EUV Photoresist / Tin Droplet TargetEUV 光阻 / 锡液滴靶 (Tin Droplet)

高功率激光打锡滴产生 13.5nm 极紫外光 — 极其小众的耗材环节High-power lasers strike tin droplets to generate 13.5nm extreme ultraviolet light — a highly specialized consumables segment.

材料Material· 3 子节点sub-nodes
特种气体 / 材料(盲区) ●Specialty Gases / Materials (Hidden Chokepoint) ●
Specialty Gases / Materials (Hidden Chokepoint) ●特种气体 / 材料(盲区) ●

刻蚀/沉积/清洗每一步都吞掉海量超纯气体和材料 — 看不见、低毛利印象,但缺一种就停线Every etch, deposition, and cleaning step consumes vast quantities of ultra-pure gases and materials — invisible and seemingly low-margin, but a missing supply shuts down the line.

能源 / 基础设施Energy / Infrastructure
高纯硅晶圆 (300mm Wafer)High-Purity Silicon Wafer (300mm Wafer)
High-Purity Silicon Wafer (300mm Wafer)高纯硅晶圆 (300mm Wafer)

一切的起点 — 12 英寸超纯单晶硅衬底The starting point of everything — a 12-inch ultra-pure single-crystal silicon substrate.

能源 / 基础设施Energy / Infrastructure
CMP 抛光液 / 抛光垫CMP Slurry / Polishing Pad
CMP Slurry / Polishing PadCMP 抛光液 / 抛光垫

每层布线后都要化学机械抛光找平Chemical mechanical planarization is required after each metal layer to level the surface.

能源 / 基础设施Energy / Infrastructure
电子特气 (NF3 / WF6 / 稀有气体)Electronic Specialty Gases (NF3 / WF6 / Rare Gases)
Electronic Specialty Gases (NF3 / WF6 / Rare Gases)电子特气 (NF3 / WF6 / 稀有气体)

刻蚀清洗用气,氖气等还供给 EUV 激光Gases used for etch and clean steps; neon and others also feed the EUV laser.

子系统Subsystem· 4 子节点sub-nodes
先进封装 · 后道 (Back-End)(盲区) ●Advanced Packaging · Back-End-of-Line (BEOL) (Hidden Chokepoint) ●
Advanced Packaging · Back-End-of-Line (BEOL) (Hidden Chokepoint) ●先进封装 · 后道 (Back-End)(盲区) ●

摩尔定律快撞墙了,性能增量越来越靠封装 — CoWoS/HBM 堆叠是 AI 芯片真正的瓶颈和暴利点Moore's Law is approaching its limits; performance gains increasingly rely on packaging — CoWoS and HBM stacking are the true bottleneck and profit center for AI chips.

部件Component
CoWoS / 中介层 (Interposer)CoWoS / Silicon Interposer
CoWoS / Silicon InterposerCoWoS / 中介层 (Interposer)

把 GPU 和 HBM 用硅中介层连在一起 — 台积电 CoWoS 产能就是 AI 芯片的硬天花板Connects GPU and HBM dies via a silicon interposer — TSMC's CoWoS capacity is the hard ceiling for AI chip supply.

部件Component
HBM 高带宽内存 (堆叠)HBM High Bandwidth Memory (3D Stacking)
HBM High Bandwidth Memory (3D Stacking)HBM 高带宽内存 (堆叠)

TSV 硅穿孔垂直堆叠的内存 — AI 芯片喂数据的命脉,缺货常态Memory stacked vertically via TSV through-silicon vias — the lifeline feeding data to AI chips, with persistent supply shortages.

部件Component
封装基板 / ABF 载板IC Substrate / ABF Build-Up Substrate
IC Substrate / ABF Build-Up Substrate封装基板 / ABF 载板

高端 IC 载板长期供不应求,味之素 ABF 绝缘膜是隐藏咽喉High-end IC substrates have been in chronic short supply; Ajinomoto ABF insulating film is the hidden chokepoint.

部件Component
引线键合 / 凸块材料Wire Bonding / Bump Materials
Wire Bonding / Bump Materials引线键合 / 凸块材料

金线/铜线/锡球等连接材料Interconnect materials including gold wire, copper wire, and solder balls.

子系统Subsystem
测试 / 良率检测Test / Yield Inspection
Test / Yield Inspection测试 / 良率检测

出厂前的最后一关,直接决定一座厂赚不赚钱The final gate before shipment, directly determining whether a fab is profitable.

子系统Subsystem
晶圆厂电力 · 超纯水 · 设施(盲区) ●Fab Power · Ultrapure Water · Facilities (Hidden Chokepoint) ●
Fab Power · Ultrapure Water · Facilities (Hidden Chokepoint) ●晶圆厂电力 · 超纯水 · 设施(盲区) ●

一座先进厂吃掉一座中型城市的电和水 — 给厂供能/净化/建设的工程公司是最不性感却最确定的受益方A leading-edge fab consumes as much power and water as a mid-sized city — the engineering firms that supply power, purification, and construction are the least glamorous yet most reliable beneficiaries.

数据来源:沪深快照 2026-06-15(导入自原站)。akshare 实时刷新待接入。仅供研究 · 非投资建议。Source: Shanghai/Shenzhen snapshot 2026-06-15 (imported from origin). Live akshare refresh pending. Research only · not investment advice.